84 |
IEEE Access |
How Does a Transformer Learn Compression? An Attention Study on Huffman and LZ4 |
10.1109/ACCESS.2023.3341512 |
20231212 |
|
83 |
Bioinformatics |
Reducing cost in DNA-based data storage by sequence analysis-aided soft information decoding of variable-length reads |
10.1093/bioinformatics/btad548 |
20230905 |
|
82 |
IEEE Access |
PyNET-QxQ: An Efficient PyNET Variant for QxQ Bayer Pattern Demosaicing in CMOS Image Sensors |
10.1109/ACCESS.2023.3272665 |
20230503 |
|
81 |
IEEE Access |
Generative Adversarial Networks for DNA Storage Channel Simulator |
10.1109/ACCESS.2023.3235201 |
20230109 |
|
80 |
Photonics |
Theoretical Study on Dual-Function Optical Phased Array of LiDAR and Optical Wireless Communication Based on Optically Injection-Locked Semiconductor Lasers |
10.3390/photonics10050498 |
20230426 |
|
79 |
Electronics |
A fast-lock variable-gain TDC-based N/M-ratio MDLL clock multiplier |
10.3390/electronics12194136 |
20231004 |
|
78 |
Electronics |
Low-Profile High-Efficiency Transmitarray Antenna for Beamforming Applications |
10.3390/electronics12143178 |
20230721 |
|
77 |
IEEE Access |
A Dual-Polarized Reconfigurable Reflectarray Antenna Based on a Symmetrically Rotated Sub-Array |
10.1109/ACCESS.2023.3280855 |
20230529 |
|
76 |
Microwave and Optical Technology Letters |
Elimination of Interference and Cross Talk from a Face-to-Face-Antennas System by a Metasurface Absorber |
10.1002/mop.33740 |
20230427 |
|
75 |
Materials |
Broadband Metasurface Absorber Based on an Optimal Combination of Copper Tiles and Chip Resistors |
10.3390/ma16072692 |
20230328 |
|
74 |
micromachines |
Investigation of the Gate Degradation Induced by Forward Gate Voltage Stress in p-GaN Gate High Electron Mobility Transistors |
10.3390/mi14050977 |
20230429 |
|
73 |
JSTS |
Security Problems of Latest FPGAs and Reverse Engineering Methods of Xilinx 7-series FPGAs |
10.5573/JSTS.2023.23.5.283 |
20231031 |
|
72 |
Micromachines |
Design of Trench MIS Field Plate Structure for Edge Termination of GaN Vertical PN Diode |
10.3390/mi14112005 |
20231028 |
|
71 |
Electronics |
Fluorine-Based Low-Damage Selective Etching Process for E-Mode p-GaN/AlGaN/GaN HFET Fabrication |
10.3390/electronics12204347 |
20231020 |
|
70 |
Electronics |
Recess-Free E-Mode AlGaN/GaN MIS-HFET with Crystalline PEALD AlN Passivation Process |
10.3390/electronics12071667 |
20230331 |
|